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Nanolithography
Tallenna

Nanolithography

sidottu, 1994
englanti
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, and so on. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. "Nanolithography" contains updated reviews by experts on the well-established techniques - electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) - as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Alaotsikko
A Borderland between STM, EB, IB, and X-Ray Lithographies
Painos
1994 ed.
ISBN
9780792327943
Kieli
englanti
Paino
446 grammaa
Julkaisupäivä
30.4.1994
Kustantaja
Springer
Sivumäärä
216