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Dry Etching for VLSI
Tallenna

Dry Etching for VLSI

This book has been written as part of a series of scientific books being published by Plenum Press. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI.
Painos
Softcover reprint of the original 1st ed. 1991
ISBN
9781489925688
Kieli
englanti
Paino
310 grammaa
Julkaisupäivä
29.5.2013
Sivumäärä
237