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Dry Etching for VLSI
Tallenna

Dry Etching for VLSI

This book has been written as part of a series of scientific books being published by Plenum Press. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI.
Painos
1991 ed.
ISBN
9780306438356
Kieli
englanti
Paino
446 grammaa
Julkaisupäivä
31.3.1991
Sivumäärä
237