Spar
Spacer Engineered FinFET Architectures
Les i Adobe DRM-kompatibelt e-bokleserDenne e-boka er kopibeskyttet med Adobe DRM som påvirker hvor du kan lese den. Les mer
This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
- Undertittel
- High-Performance Digital Circuit Applications
- Forfatter
- Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal
- ISBN
- 9781351751049
- Språk
- Engelsk
- Utgivelsesdato
- 26.6.2017
- Forlag
- CRC PRESS
- Tilgjengelige elektroniske format
- PDF - Adobe DRM
- Les e-boka her
- E-bokleser i mobil/nettbrett
- Lesebrett
- Datamaskin
