
Radicals on Surfaces
This comprehensive review describes new trends in the field. Leading experts write about the nature of surface active sites, methods to identify them, and the radicals formed from adsorbed molecules interacting with the surface. The emphasis is on the fundamentals covering thermal, photostimulated and radiation induced reactions as well as diffusion processes. This provides the necessary background for technological applications.
This book will be useful to those who are interested in surface chemistry, heterogeneous catalysis as well as those who want to study reactive intermediates in chemical reactions. It is also of interest to scientists in photo and radiation physics and chemistry.
- Redaktør
- A. Lund, C.J. Rhodes
- Opplag
- 1995 ed.
- ISBN
- 9780792331087
- Språk
- Engelsk
- Vekt
- 446 gram
- Utgivelsesdato
- 31.1.1995
- Forlag
- Springer
- Antall sider
- 318
