Plasma Processing of Semiconductors

Taken from the proceedings of a symposium in France in 1996, this text contains 28 contributions from 18 contributors, and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. The book should be suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.