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Plasma Etching
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Plasma Etching

Forfatter:
innbundet, 1998
Engelsk
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Undertittel
Fundamentals and Applications
Forfatter
M. Sugawara
ISBN
9780198562870
Språk
Engelsk
Vekt
743 gram
Utgivelsesdato
28.5.1998
Antall sider
356