Gå direkte til innholdet
Glow-Discharge Hydrogenated Amorphous Silicon
Spar

Glow-Discharge Hydrogenated Amorphous Silicon

Forfatter:
innbundet, 1989
Engelsk
A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
Forfatter
K. Tanaka
Opplag
1990 ed.
ISBN
9780792303091
Språk
Engelsk
Vekt
446 gram
Utgivelsesdato
30.11.1989
Forlag
Springer
Antall sider
277