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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System

Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data.
Opplag
2014 ed.
ISBN
9784431547945
Språk
Engelsk
Vekt
310 gram
Utgivelsesdato
17.2.2014
Antall sider
40