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The Physics of Submicron Lithography
Tallenna

The Physics of Submicron Lithography

In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer.
Kirjailija
Kamil A. Valiev
Painos
Softcover reprint of the original 1st ed. 1992
ISBN
9781461364610
Kieli
englanti
Paino
310 grammaa
Julkaisupäivä
27.9.2012
Sivumäärä
493