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Reactive Sputter Deposition
Tallenna

Reactive Sputter Deposition

In the family of Physical Vapour Deposition techniques, sputtering is one of the most important. This book describes various aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth allowing the reader to understand the complete process.
Painos
2008 ed.
ISBN
9783540766629
Kieli
englanti
Paino
446 grammaa
Julkaisupäivä
24.4.2008
Sivumäärä
572