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Plasma Etching
Tallenna

Plasma Etching

Kirjailija:
sidottu, 1998
englanti
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Alaotsikko
Fundamentals and Applications
Kirjailija
M. Sugawara
ISBN
9780198562870
Kieli
englanti
Paino
743 grammaa
Julkaisupäivä
28.5.1998
Sivumäärä
356