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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
Tallenna

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

Painos
Softcover Reprint of the Original 1st 2018 ed.
ISBN
9783030094553
Kieli
englanti
Paino
310 grammaa
Julkaisupäivä
8.2.2019
Sivumäärä
138