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Physical Deposition Methods for Films and Coatings

Kirjailija:
Sidottu, 2025
englanti
198,00 €

Comprehensive resource on the subject of deposition techniques for films and coatings and their characterization Physical Deposition Methods for Films and Coatings presents a pedagogical compilation of current knowledge of dry deposition. Written by a renowned and awarded academic with more than 40 years of experience in the field, Physical Deposition Methods for Films and Coatings covers topics including: The process of making a deposit that appears on the surface, growth of deposits, their post treatments, and characterization methods Different physical and chemical deposition techniques including atomistic, chemical vapor, and various thermal spraying methods Properties of deposits depending on the material and deposition technique Substrate preparation, coating microstructure, and morphology and stability of thin films Examples of applications of thin films in optical devices, environmental applications, telecommunications devices, and energy storage devices Physical Deposition Methods for Films and Coatings is an essential reference on the subject for professionals and researchers in surface treatment and graduate students in related programs of study.

Kirjailija
Pawlowski Lech
ISBN
9781119713067
Kieli
englanti
Paino
964 grammaa
Julkaisupäivä
21.2.2025
Sivumäärä
432