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Low Pressure Plasmas and Microstructuring Technology
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Low Pressure Plasmas and Microstructuring Technology

Kirjailija:
sidottu, 2009
englanti
Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching.
Kirjailija
Gerhard Franz
Painos
2009 ed.
ISBN
9783540858485
Kieli
englanti
Paino
446 grammaa
Julkaisupäivä
30.4.2009
Sivumäärä
732