Tallenna
Ion Implantation in Semiconductors
nidottu, 2013
englanti
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974.
- Alaotsikko
- Science and Technology
- Toimittaja
- Susumu Namba
- Painos
- Softcover reprint of the original 1st ed. 1975
- ISBN
- 9781468421538
- Kieli
- englanti
- Paino
- 310 grammaa
- Julkaisupäivä
- 29.4.2013
- Kustantaja
- Springer-Verlag New York Inc.
- Sivumäärä
- 742
