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Ion Implantation
Tallenna

Ion Implantation

sidottu, 2012
englanti
Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.
Toimittaja
Mark Goorsky
ISBN
9789535106340
Kieli
englanti
Paino
446 grammaa
Julkaisupäivä
30.5.2012
Kustantaja
In Tech
Sivumäärä
450