
High Dielectric Constant Materials
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS).
- Alaotsikko
- VLSI MOSFET Applications
- Toimittaja
- Howard Huff, David Gilmer
- Painos
- Softcover reprint of hardcover 1st ed. 2005
- ISBN
- 9783642059216
- Kieli
- englanti
- Paino
- 310 grammaa
- Julkaisupäivä
- 21.10.2010
- Sivumäärä
- 710