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Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets
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Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets

This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets.

Painos
Softcover reprint of the original 1st ed. 2017
ISBN
9783319882840
Kieli
englanti
Paino
310 grammaa
Julkaisupäivä
18.5.2018
Sivumäärä
164