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Glow Discharge Processes
Tallenna

Glow Discharge Processes

Kirjailija:
sidottu, 1980
englanti
293,20 €
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications—practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
Alaotsikko
Sputtering and Plasma Etching
Kirjailija
Brian Chapman
ISBN
9780471078289
Kieli
englanti
Paino
848 grammaa
Julkaisupäivä
5.11.1980
Sivumäärä
432