Siirry suoraan sisältöön
Glow-Discharge Hydrogenated Amorphous Silicon
Tallenna

Glow-Discharge Hydrogenated Amorphous Silicon

Kirjailija:
sidottu, 1989
englanti
A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
Kirjailija
K. Tanaka
Painos
1990 ed.
ISBN
9780792303091
Kieli
englanti
Paino
446 grammaa
Julkaisupäivä
30.11.1989
Kustantaja
Springer
Sivumäärä
277