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Design for Manufacturability with Advanced Lithography
Tallenna

Design for Manufacturability with Advanced Lithography

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).
Kirjailija
Bei Yu, David Z. Pan
Painos
Softcover reprint of the original 1st ed. 2016
ISBN
9783319373935
Kieli
englanti
Paino
310 grammaa
Julkaisupäivä
23.8.2016
Sivumäärä
164