Siirry suoraan sisältöön
Design for Manufacturability with Advanced Lithography
Tallenna

Design for Manufacturability with Advanced Lithography

Kirjailija:
sidottu, 2015
englanti
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).
Kirjailija
Bei Yu, David Z. Pan
Painos
1st ed. 2016
ISBN
9783319203843
Kieli
englanti
Paino
446 grammaa
Julkaisupäivä
23.11.2015
Sivumäärä
164