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Chemical Vapor Deposition
Tallenna

Chemical Vapor Deposition

sidottu, 2016
englanti
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Alaotsikko
Recent Advances and Applications in Optical, Solar Cells and Solid State Devices
Toimittaja
Sudheer Neralla
ISBN
9789535125723
Kieli
englanti
Paino
446 grammaa
Julkaisupäivä
31.8.2016
Kustantaja
IntechOpen
Sivumäärä
290