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Ion Implantation Science and Technology
Ion Implantation Science and Technology
Tallenna

Ion Implantation Science and Technology

Lue Adobe DRM-yhteensopivassa e-kirjojen lukuohjelmassaTämä e-kirja on kopiosuojattu Adobe DRM:llä, mikä vaikuttaa siihen, millä alustalla voit lukea kirjaa. Lue lisää
Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved in the subject. The book is divided into two parts - Part 1: Ion Implantation Science and Part 2: Ion Implantation Technology. Part 1 covers topics such as the stopping and range of ions in solids; ion implantation damage in silicon; experimental annealing and activation; and the measurement on ion implantation. Part 2 includes ion optics and focusing on implanter design; photoresist problems and particle contamination; ion implantation diagnostics and process control; and emission of ionizing radiation from ion implanters. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.
Toimittaja
J.F. Ziegler
ISBN
9780323161657
Kieli
englanti
Julkaisupäivä
2.12.2012
Formaatti
  • PDF - Adobe DRM
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