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Plasma Etching

Författare:
inbunden, 1998
Engelska
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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Undertitel
Fundamentals and Applications
Författare
M. Sugawara
ISBN
9780198562870
Språk
Engelska
Vikt
743 gram
Utgivningsdatum
1998-05-28
Sidor
356