
Principles of Chemical Vapor Deposition
This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field.
- Författare
- D.M. Dobkin, M.K. Zuraw
- Upplaga
- 1st ed. Softcover of orig. ed. 2003
- ISBN
- 9789048162772
- Språk
- Engelska
- Vikt
- 310 gram
- Utgivningsdatum
- 2010-12-01
- Förlag
- Springer
- Sidor
- 273
