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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System

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Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data.
Författare
Seiji Samukawa
Upplaga
2014 ed.
ISBN
9784431547945
Språk
Engelska
Vikt
310 gram
Utgivningsdatum
2014-02-17
Sidor
40