Spara
Ion Implantation in Semiconductors
häftad, 2013
Engelska
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974.
- Undertitel
- Science and Technology
- Redaktör
- Susumu Namba
- Upplaga
- Softcover reprint of the original 1st ed. 1975
- ISBN
- 9781468421538
- Språk
- Engelska
- Vikt
- 310 gram
- Utgivningsdatum
- 2013-04-29
- Sidor
- 742
