
High-NA EUV Imaging and Mask 3D Effects
- Undertitel
- 0.55 NA anamorphic optics, reflective reticle, absorber shadowing, telecentricity error, Bossung tilt, best-focus shift, k1 optimization, 2 nm/3 nm node patterning, EPE/MEEF budgeting With Python
- Författare
- H Wu
- ISBN
- 9798279044078
- Språk
- Engelska
- Vikt
- 794 gram
- Utgivningsdatum
- 19.12.2025
- Förlag
- Independently Published
- Sidor
- 342