
High Dielectric Constant Materials
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS).
- Undertitel
- VLSI MOSFET Applications
- Redaktör
- Howard Huff, David Gilmer
- Upplaga
- Softcover reprint of hardcover 1st ed. 2005
- ISBN
- 9783642059216
- Språk
- Engelska
- Vikt
- 310 gram
- Utgivningsdatum
- 2010-10-21
- Sidor
- 710