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Advanced Ta-Based Diffusion Barriers for Cu Interconnects
häftad,
2009,
Engelska,
ISBN 9781604564518
During the last few years, copper has become the standard metallisation material for on-chip interconnects in high-performance microprocessors. Compared to the previously used …
Advanced Ta-Based Diffusion Barriers for Cu Interconnects
E-bok,
2008,
Engelska,
ISBN 9781607416753
During the last few years, copper has become the standard metallization material for onchip interconnects in high-performance microprocessors. Compared to the previously used …