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The current rapid development of photonics matches the progress of silicon-integrated circuits. However, the ultimate success of photonics requires integration of both active and …
There has been tremendous progress lately in the field of III-nitride (GaN, AlN, InN) semiconductors and their device applications. For example, the invention of III-nitride-based …
Symposium S, 'Microelectromechanical Systems - Materials and Devices IV', held November 29–December 3 at the 2010 MRS Fall Meeting in Boston, Massachusetts, focused on micro- and …
This proceedings volume contains papers presented at Symposium I, 'Materials for End-of-Roadmap Scaling of CMOS Devices', and Symposium J, 'Materials and Devices for Beyond CMOS …
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book was first published in 1993.
Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. …
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.