Hakutulokset: ru
yhteensä 2 776 hakutulosta
Resilience of Luxury Companies in Times of Change
Why do some luxury companies remain resilient through times of change, while others do not? The reason is that these companies have unique skills to diversify their revenue …
Endohedral Fullerenes: From Fundamentals To Applications
Endohedral fullerenes represent a novel family of carbon nanostructures, which are characterized by a robust fullerene cage with atoms, ions, or clusters trapped in its interior. …
kang de yu qi ye gong min lun li de gong si ru he ke neng
Os Ru dos Do Sil ncio
gao zhong xue sheng rong ru dong shou zuo shi yan qi cai yu shi yan jiao xue dui yu niu dun yun dong ding lv zhi mi si gai nian ying xiang
Clinical Applications of Mifepristone (RU486) and Other Antiprogestins
Mifepristone (RU486), the first clinically available antiprogestin, has generated great interest since its discovery in the early 1980s. Today, it is recognized that mifepristone, …
Low-carbon Cementitious Materials with 100% Solid Wastes
Given its scope, the book is a valuable reference book for research students and reference resources for researchers, academics, and industrial scientists working in the field of …
Nalipki-kartinki: Drakon (ru)
Hydromechanik oder die technische Mechanik flüssiger Körper
Hydromechanik oder die technische Mechanik fl ssiger K rper ist ein unver nderter, hochwertiger Nachdruck der Originalausgabe aus dem Jahr 1880. Hansebooks ist Herausgeber von …
Neurobiology of Glycoconjugates
Ten years ago the general area covered in this volume was comprehensively surveyed for the first time (Complex Carbohydrates of Nervous Tissue. Plenum Press, 1979). The revised …
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material. …
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material. …