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To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here …
Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, …
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Smart/intelligent systems employ active materials as sensors/actuators to respond to environmental conditions for next-generation machines and structures - applications ranging …
Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. …
This proceedings volume contains papers presented at Symposium I, 'Materials for End-of-Roadmap Scaling of CMOS Devices', and Symposium J, 'Materials and Devices for Beyond CMOS …
This book is a compilation of papers presented at Symposium 4, Materials Characterization, held at the XVIII International Materials Research Congress 2009 in Cancun, Mexico. The …
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book was first published in 1993.
There has been tremendous progress lately in the field of III-nitride (GaN, AlN, InN) semiconductors and their device applications. For example, the invention of III-nitride-based …